Aqueous based inline cleaning machines are widely used within high-volume electronics manufacturing processes in order to remove flux residues. Typically, these systems are spray in air machines operating at mid/high pressure from 2-6 bars.

Given these pressure conditions, wash solution nebulises and escapes the cleaning equipment through the required exhaust system. However, this exhaust stream includes water vapor as well as valuable cleaning agent. 

The Zestron Demister is engineered to recover exhaust aerosols from the exhaust system, thereby, enabling the partial recovery of cleaning agent concentrate.